Description

The NLD-570 system is perfect for etching, SiO2, quartz glass, Pyrex, LN, LT etc. with excellent uniformity, good profile control and surface roughness. The system generates high density plasma having low electron temperature and allows for low process pressure yielding high etch rates even on tough materials Quartz > 1μm/min, Pyrex > 0.8 μm/min.

Additional Resources

ULVAC NLD-570
Training Contact: Sivasubramanian Somu
Service Contact: Scott McNamara