Nanonex 2000, an imprinting lithography tool can perform all forms of nanoimprinting, including thermal and photocurable nanoimprinting as well as direct nanoimprinting. It employs an air cushion press TM (ACP) which gives not only excellent uniformity over entire wafer in nanoscale, but also extremely fast processing time (less than 40 sec for a thermal plastics resists). When combined with appropriate resists, they can have sub-5 nm resolution, 1% CD control, high pattern fidelity and excellent uniformity.

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Nanonex NX2000
Training Contact: Sivasubramanian Somu
Service Contact: Scott McNamara