Carl Zeiss 1540 cross beam system uses a focus ion beam with gallium metal ion beam source for nanoscale patterning and sculpting. Materials can be milled or deposited while observing the evolution of the surface topography feature of the specimen with ion beam stimulated secondary electrons. Additionally, a highly focused electron column provides the capabilities for high spatial resolution secondary electron imaging as well as backscattered electron imaging for sub-micron depth characterization. The system comes with five gas injector system for ion beam deposition of metals or insulators and for enhanced etching. A resolution of 5nm and 1.1 nm can be achieved with the FIB and SEM columns. The system is also equipped with active vibration isolation and field cancellation system.
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