Park XE7 provides accurate measurement at highest nanoscale resolution due its flat, orthogonal, and linear scan measurements by its unique AFM architecture: independent XY and Z, flexure based scans. The XY scanner consists of symmetrical 2-dimensional flexure and high-force piezoelectric stacks provides high orthogonal movement with minimal out-of-plane motion as well as high responsiveness essential for precise sample scanning in the nanometer scale. The travel range of the XY sample stage is 13 mm x 13 mm. The focus mechanism for the on-axis optics is adjusted manually. Metrology can be done employing true non-contact, basic contact, lateral force and phase imaging modes.